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There's an interesting video on YouTube from Binary Millenium showing how to make a 3D model out of real objects using Microsoft's Photosynth. It's an interesting idea that, while unofficial, may be a big time saver and a lot of fun for many of you. This will work best if you use a Photosynth that not only has a high rate of 'synthiness' but also lots of points in the point cloud. A point in the point cloud means that a specific feature has been identified in two or more photos, allowing for Photosynth to determine to some degree where in space that point exists. While a good Photosynth might have 100% synthiness, meaning all the pictures are connected, it doesn't necessarily mean there will be lots of points in the point cloud.

There's an interesting video on YouTube from Binary Millenium showing how to make a 3D model out of real objects using Microsoft's Photosynth. It's an interesting idea that while unofficial, may be a big time saver and a lot of fun for many of you. This will work best if you use a Photosynth that not only has a high rate of 'synthiness' but also tons of points in the point cloud. A point in the point cloud means that a specific feature in two more photos has been identified allowing for Photosynth to some degree determine where in space that point exists. While a good Photosynth might have 100% synthiness, meaning all the pictures were connected, it doesn't necissarily mean there will be lots of points in the point cloud.

Model based Optical proximity correction is usually used to compensate for the pattern distortion during the microlithography process. Currently, almost all the lithography effects, such as the proximity effects from the limited NA, the 3D mask effects due to the shrinking critical dimension, the photo resist effects, and some other well known physical process, can all be well considered into modeling with the OPC algorithm. However, the micro-lithography is not the final step of the pattern transformation procedure from the mask to the wafer. The etch process is also a very important stage. It is well known that till now, the etch process still can't be well explained by physics theory. In this paper, we will demonstrate our study on the model based etch bias retarget for OPC.