Silicon Pedestal
The Silicon Pedestal is a pure silicone base product designed to ensure temperature stability in the thermal reaction tube during silicon wafer processing, thereby enhancing insulation efficiency. Silicon wafer processing is an extremely precise procedure where temperature plays a crucial role, directly impacting the thickness and uniformity of the silicon wafer film.
Silicon Carbide Tubes
In the LPCVD equipment, the sic tube is one of the cores of the entire equipment, with an inner tube and an outer tube. LPCVD equipment is a kind of CVD equipment, which generates solid reactants through chemical reaction of mixed gases under low pressure and high temperature conditions and deposits them on the surface of silicon wafers to form thin films.
Silicon Susceptor
The silicon carbide susceptor is utilized in semiconductor CVD and PVD machines to provide support for wafers during high-temperature processes, ensuring stability and preventing any potential damage caused by nitrogen flow or accidental dropping.
Additionally, it can also be utilized as a wafer carrier in semiconductor etching equipment.
Features of DSTC SIC Susceptor
1
The minimum thickness reaches 1mm; High purity; Recyclable and reusable.
2
Self-developed cleaning technology, the surface metal ion residue meets the requirements of silicon wafer treatment process.
3
Mature processing process.
Silicon Susceptor Gallery
The Silicon Susceptor is utilized for transporting the wafer.
As one of silicon carbide semiconductor manufacturers, we will do our best to meet all the needs of customers.